• 专利标题:   Graphene element used as field effect transistor having top gate structure, comprises boron nitride layer having turbostratic structure, and graphene layer in contact with boron nitride layer.
  • 专利号:   JP2022163868-A
  • 发明人:   KONDO O
  • 专利权人:   FUJITSU LTD
  • 国际专利分类:   C01B032/182, C30B029/02, H01L021/02, H01L021/20, H01L021/205, H01L021/336, H01L029/786, H01L051/05, H01L051/30, H01L051/40
  • 专利详细信息:   JP2022163868-A 27 Oct 2022 H01L-029/786 202200 Pages: 32 Japanese
  • 申请详细信息:   JP2022163868-A JP068970 15 Apr 2021
  • 优先权号:   JP068970

▎ 摘  要

NOVELTY - Graphene element (100) comprises a boron nitride layer (120) having a turbostratic structure, and a graphene layer (130) in contact with the boron nitride layer. USE - The graphene element is used as field effect transistor having top gate structure. ADVANTAGE - The graphene element suppresses variations in characteristics affected by solvent and resist residues used in transferring graphene. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of the graphene element. 100Graphene element 110Substrate 111Silicon substrate 112Silicon oxide film 120Boron nitride layer 121Top surface 122Side surface 130Graphene layer 140Insulating layer 151Source electrode 152Drain electrode 153Gate electrode