• 专利标题:   Graphene-based thin film transistor used as a highly integrated semiconductor/transistor, comprises a second electrode located on the other side of the active layer, and a gate electrode.
  • 专利号:   WO2020171341-A1, KR2020101714-A
  • 发明人:   CHOI H, PARK B, HAN Y, YOON S G, IREH H
  • 专利权人:   UNIV IND ACADEMIC COOP IN CHUNGNAM NAT
  • 国际专利分类:   H01L021/324, H01L029/16, H01L029/786
  • 专利详细信息:   WO2020171341-A1 27 Aug 2020 H01L-029/786 202074 Pages: 28
  • 申请详细信息:   WO2020171341-A1 WOKR014120 25 Oct 2019
  • 优先权号:   KR019924

▎ 摘  要

NOVELTY - The thin film transistor comprises a second electrode (152) located on the other side of the active layer,and a gate electrode (120). A gate insulating layer (130) positioned on the gate electrode. An active layer (140) positioned on a portion of the gate insulating layer and including a nitrogen-doped graphene layer. A first electrode (151) positioned on one side of the active layer. The nitrogen-doped graphene layer is a titanium layer deposited on the gate insulating layer in an oxygen-free atmosphere, and then a graphene layer is directly generated and doped'nitrogen-doped graphene layer. The gate electrode has a graphene layer. USE - Graphene-based thin film transistor used as a highly integrated semiconductor/transistor. ADVANTAGE - Ensures to reduce the manufacturing cost and improves product quality through simplification of the manufacturing process. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for manufacturing a graphene-based thin film transistor. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of the graphene-based thin film transistor used as a highly integrated semiconductor/transistor. Substrate (110) Gate electrode (120) Gate insulating layer (130) Active layer (140) First electrode (151) Second electrode (152)