▎ 摘　　要

NOVELTY - The method involves utilizing a compression molding process to form a protruding structure on a first polymer substrate (11). A first graphene layer is formed (12) on the first polymer substrate with the protruding structure. The first polymer substrate comprising the first graphene layer is bind (14) together with a second substrate comprising a conductive layer. Two insulating material support columns are positioned between the first polymer substrate and the second substrate, where height of the support columns creates a gap between the first graphene layer and the conductive layer. USE - Method for preparing a capacitor. ADVANTAGE - The method enables arranging the supporting columns on two side ends of the first polymer substrate, so that the first polymer substrate forms a capacitor structure, which has better physical and structural stability. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a capacitor. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating a method for preparing a capacitor. '(Drawing includes non-English language text)' Step for utilizing compression molding process to form protruding structure on first polymer substrate (11) Step for forming first graphene layer on first polymer substrate with protruding structure (12) Step for preparing extraction electrode on first graphene layer of first polymer substrate (13) Step for binding first polymer substrate comprising first graphene layer together with second substrate comprising conductive layer (14)