• 专利标题:   Method for preparing liquid copper substrate utilized for preparing large single crystal graphene in field effect transistor device, involves placing solid copper on copper-tungsten alloy substrate, and heating in hydrogen atmosphere.
  • 专利号:   CN104389016-A, CN104389016-B
  • 发明人:   LIU Y, WU B, WANG L, YU G, CHEN J
  • 专利权人:   CHINESE ACAD SCI CHEM INST
  • 国际专利分类:   C30B025/14, C30B025/18, C30B029/02, H01L029/78
  • 专利详细信息:   CN104389016-A 04 Mar 2015 C30B-029/02 201536 Pages: 12 Chinese
  • 申请详细信息:   CN104389016-A CN10584893 27 Oct 2014
  • 优先权号:   CN10584893

▎ 摘  要

NOVELTY - A liquid copper substrate preparing method involves placing a solid copper on a copper-tungsten alloy substrate, and heating in a hydrogen atmosphere until the reactor temperature reaches above the melting point of copper. USE - Method for preparing a liquid copper substrate that is utilized for preparing a large single crystal graphene in a field effect transistor device (claimed). ADVANTAGE - The method enables providing uniform nucleation rate and rapid growth rate of graphene using the liquid copper substrate, and achieving controllable size of grapheme. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a method for preparing a large single crystal graphene, which involves using chemical vapor deposition in an inert gas atmosphere and under hydrogen, catalytic cracking of the copper substrate surface, forming a large single crystal grown graphene, and cooling under an inert gas atmosphere to room temperature to obtain the large single crystal graphene.