• 专利标题:   Detecting graphene defects comprises detecting the graphene to be measured by nuclear magnetic resonance, obtaining the chemical shift, calculating standard deviation and measuring the graphene.
  • 专利号:   CN107764849-A
  • 发明人:   ZHENG S, QIU W
  • 专利权人:   UNIV SOUTHWEST
  • 国际专利分类:   G01N024/08
  • 专利详细信息:   CN107764849-A 06 Mar 2018 G01N-024/08 201827 Pages: 19 Chinese
  • 申请详细信息:   CN107764849-A CN10963532 16 Oct 2017
  • 优先权号:   CN10963532

▎ 摘  要

NOVELTY - Detecting graphene defects comprises (i) detecting the graphene to be measured by nuclear magnetic resonance and obtaining the chemical shift of each carbon having a chemical shift more than 120.09 in the graphene, (ii) calculating the standard deviation of the chemical shift of each carbon with the chemical shift more than 120.09 obtained in step (i) to obtain the standard deviation and (iii) measuring the graphene. USE - The method is useful for detecting graphene defects. ADVANTAGE - The method provides accurate result and is simple. DETAILED DESCRIPTION - Detecting graphene defects comprises (i) detecting the graphene to be measured by nuclear magnetic resonance and obtaining the chemical shift of each carbon having a chemical shift more than 120.09 in the graphene, (ii) calculating the standard deviation of the chemical shift of each carbon with the chemical shift more than 120.09 obtained in step (i) to obtain the standard deviation and (iii) measuring the graphene using a double void defect when the standard deviation obtained in step (ii 0 is 4.84-8.44, measuring the graphene by a topological defect when the standard deviation obtained in step (ii) is 5.93-8.90 and measuring the graphene having a single vacancy defect when the standard deviation obtained in step (ii) is 50.37-84.05