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  • 专利标题:   Graphene dispersion used for forming graphene film, comprises reduced graphene oxide dispersed in organic solvent chosen from dimethylformamide, dimethylsulfoxide and acetonitrile.
  • 专利号:   KR2013053020-A, KR1345004-B1
  • 发明人:   KIM D P, PARK C P
  • 专利权人:   UNIV IND ACADEMIC COOP IN CHUNGNAM NAT, UNIV IND ACADEMIC COOP IN CHUNGNAM NAT
  • 国际专利分类:   C01B031/02, G01N027/407, H01M004/96
  • 专利详细信息:   KR2013053020-A 23 May 2013 C01B-031/02 201368 Pages: 11
  • 申请详细信息:   KR2013053020-A KR118467 14 Nov 2011
  • 优先权号:   KR118467

▎ 摘　　要

NOVELTY - A graphene dispersion comprises reduced graphene oxide dispersed in organic solvent chosen from dimethylformamide, dimethylsulfoxide and acetonitrile. USE - Graphene dispersion used for forming graphene film. ADVANTAGE - The reduced graphene oxide is uniformly dispersed in the dispersion. The graphene oxide film having excellent electric conductance is formed using the dispersion. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacture of the graphene dispersion.