▎ 摘　　要

NOVELTY - A ceramic structure (1) comprises silicon carbide, silicon carbonitride, titanium carbide or titanium carbonitride as a main component, and two main surfaces (11a) and (11b) opposite to each other. The carbon concentration is higher at the surface (11a) than at the surface (11b) as determined by element mapping using an electron beam microanalyzer. USE - Ceramic structure for forming component (claimed) of plasma processing apparatus. Can also be used for image forming apparatus, electromagnetic shield material, antistatic material, halation prevention component for electronic components quality inspection device, clamping jig for cleaning device, mounting table, flange receiving portion, semiconductor wafer transfer arm, peripheral sliding components, holding components, etc. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of ceramic structure. Ceramic structure (1) Main surfaces (11a,11b)