• 专利标题:   Method for preparing patterned graphene used in micro-mechanical, electronic device, and energy battery, involves positioning substrate with polymer film, and providing substrate on surface of vacuum chamber of electronic cyclotron resonance plasma nano-surface treatment system.
  • 专利号:   CN114890409-A
  • 发明人:   DIAO D, WANG J, CHEN C
  • 专利权人:   UNIV SHENZHEN
  • 国际专利分类:   C01B032/184
  • 专利详细信息:   CN114890409-A 12 Aug 2022 C01B-032/184 202284 Chinese
  • 申请详细信息:   CN114890409-A CN10420918 21 Apr 2022
  • 优先权号:   CN10420918

▎ 摘  要

NOVELTY - The method involves providing a substrate with a polymer film on a surface. The substrate is positioned with the polymer film. The substrate is provided on a surface of a vacuum chamber of an electronic cyclotron resonance plasma nano-surface treatment system. A mask plate is covered with a preset pattern. The preset pattern is fixed on a surface of the polymer film. E lectron irradiation is performed to obtain a final product. The polymer is added to solvent to obtain polymer solution. A material of the mask plate with preset pattern is selected from a metal material. USE - Method for preparing patterned graphene used in micro-mechanical, electronic device, and energy battery. ADVANTAGE - The method enables preparing to obtain patterned graphene in one step, reducing preparation period, and effectively avoiding using of organic matter to clean cracked ring and pollution of the graphene. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of an electronic device.