▎ 摘　　要

NOVELTY - The method involves mounting (402) an unpatterned graphene layer on a substrate comprising an unpatterned metal layer to form an unpatterned graphene-metal bi-layer attached to a surface of the substrate. The bi-layer through the graphene layer and the metal layer are patterned (403) with a design comprising superimposed trenches. Each of the trenches extend through the graphene layer and the metal layer to provide interaction with electromagnetic radiation. The patterning is performed using a single mask defining the design to create the trenches through the graphene layer and the metal layer. The single mask is used for performing both of etching of the graphene layer and etching of the metal layer. USE - Method for manufacturing electromagnetic radiation interaction device (claimed). ADVANTAGE - The graphene comes into direct contact with the dielectric layer, which results in improved adhesion of the graphene to the chip. The device is effective, with tuneability or reconfigurability, and has a design that can be realized physically. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for an electromagnetic radiation interaction device. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating a method for manufacturing electromagnetic radiation interaction device. 400Method for manufacturing electromagnetic radiation interaction device 401Step for mounting metal layer on a dielectric substrate 402Step for mounting graphene layer on the metal layer 403Step for patterning bi-layer through the graphene layer and the metal layer with a design comprising superimposed trenches