▎ 摘 要
NOVELTY - The method involves providing sheet of graphene-based material comprising multi-layer graphene having 5-20 graphene layers. Sheet of graphene-based material comprising multi-layer graphene is exposed to particle beam having ion energy of about 1500 eV to produce damage tracks (2) in multi-layer graphene, where tracks are extended through basal planes of graphene sheets. Sheet of graphene-based material comprising multi-layer graphene is exposed to chemical etch (3) to remove carbon atoms from graphene at damage tracks and open pores extending through multiple graphene sheets. USE - Method for producing pores in sheet of graphene-based material (claimed). ADVANTAGE - Since the damage tracks in the graphene sheets are exposed to the chemical etch, the pores are defined through the stacked graphene sheets. Thus, the production of the damage tracks and etching of the damage tracks are carried out while the graphene is arranged on the substrate. DETAILED DESCRIPTION - The chemical etch is an oxidant that is selected from group consisting of ozone, aqueous solution of potassium permanganate, aqueous solution of potassium permanganate and sulfuric acid, aqueous solution of potassium permanganate and potassium hydroxide and solution of hydrogen peroxide and sulfuric acid. The ion energy is greater than 1.5 keV and less than 100 keV. The particle beam is comprised of ions selected from group consisting of xenon ions, neon ions, argon ions, tropyllium ions, and ferrocenium ions. The graphene is arranged on substrate when producing damage tracks. The substrate is comprised as metal growth substrate. An INDEPENDENT CLAIM is included for a sheet of graphene-based material comprising multi-layer graphene and comprising pores. The size of the pores is ranged from 0.2 nm 50 nm. DESCRIPTION OF DRAWING(S) - The drawing shows an explanatory view illustrating the introduction of pores into stacked graphene sheets. Ion beam exposure (1) Damage track (2) Selective chemical etch (3)