▎ 摘　　要

NOVELTY - Depositing high-quality aluminum oxide thin films on the surface of graphene comprises cleaning the graphene substrate and adding into an atomic layer deposition chamber, passing water molecules into the atomic layer deposition chamber for pretreatment, passing aluminum precursors and oxygen precursors are through to carry out the atomic layer deposition process, obtaining required film thickness by controlling different cycle numbers after the deposition is completed, cooling temperature of the atomic layer deposition chamber to room temperature, and taking aluminum oxide thin film sample. USE - The method is useful for depositing high-quality aluminum oxide thin films on the surface of graphene. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic flow diagram of the method for depositing high-quality aluminum oxide thin films on surface of graphene (Drawing includes non-English language text).