▎ 摘　　要

NOVELTY - Manufacture of non-catalytic graphene-grown substrate involves forming a substrate free of catalyst layer at the surface, supplying a gas containing carbon, performing inductively coupled plasma chemical vapor deposition at low temperature, supplying etching gas, adsorbing hydrocarbon radicals, diffusing on the surface of nucleus by Van der Waals force, growing hetero-epitaxially, performing inductively coupled plasma chemical vapor deposition constantly and growing graphene. USE - Manufacture of non-catalytic graphene-grown substrate for manufacturing electronic component (all claimed). DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) non-catalytic graphene-grown substrate; and (2) manufacturing device of non-catalytic graphene-grown substrate.