• 专利标题:   Multi-plane adaptive gas phase deposition device for producing graphene cathode material, has vapor deposition tank whose inner side wall is close to fixedly connected with part of side part spraying port.
  • 专利号:   CN215628283-U
  • 发明人:   QI G, ZHU J, CHI X
  • 专利权人:   WUHAN HANYUPIN NEW MATERIAL CO LTD
  • 国际专利分类:   C23C014/22, C23C014/50, C23C016/455, C23C016/458
  • 专利详细信息:   CN215628283-U 25 Jan 2022 C23C-016/455 202218 Chinese
  • 申请详细信息:   CN215628283-U CN21449450 28 Jun 2021
  • 优先权号:   CN21449450

▎ 摘  要

NOVELTY - The utility model claims a multi-plane adaptive gas phase deposition device, relating to the technical field of vapour deposition device, comprising a base, the top of the base fixedly connected with with a first supporting rod, the top of the first supporting rod fixedly connected with supporting plate, the top of the supporting plate fixedly connected with a second supporting rod, the top of the second supporting rod fixedly connected with vapor deposition box, the side wall of the vapor deposition box close to the bottom is connected with a hinge, the hinge is connected with a box door, the external power supply is used, the motor is electrified, the motor drives the screw rod to rotate by controlling the operation of the turbine worm lifter, and the screw axially moves in the vertical direction, the screw drives the lifting platform to ascend and rotate, supplying air to the air inlet pipe, when the gas is sprayed from the top nozzle and the side nozzle, the product can be coated; the structure can reach the effect of multi-angle plating film, It can avoid the difference of the gas deposition thickness of the top and side part of the product to be processed, so as to improve the spraying effect