• 专利标题:   Graphene strip heterojunction double gate TFET, has bottom gate located at bottom part of gate oxide layer, and strip extended into channel section corresponding to inclined angle formed along extending direction of graphene nano-strip.
  • 专利号:   CN109037321-A
  • 发明人:   WANG J, FENG L, RUAN L, ZHAO W, ZHANG H
  • 专利权人:   UNIV HANGZHOU DIANZI
  • 国际专利分类:   H01L029/739, H01L029/10, H01L029/06, H01L029/165, H01L021/331
  • 专利详细信息:   CN109037321-A 18 Dec 2018 H01L-029/739 201911 Pages: 8 Chinese
  • 申请详细信息:   CN109037321-A CN10647726 22 Jun 2018
  • 优先权号:   CN10647726

▎ 摘  要

NOVELTY - The TFET has a bottom gate located at a bottom part of a gate oxide layer. A top gate located at a top part of the gate oxide layer. A channel is formed between the top gate and the bottom gate along length direction. The channel is formed with a channel section that is arranged along a direction from a source region to a drain region, where the channel section and the drain region are made of armchair-type graphene nano-strips. The strip is extended into the channel section corresponding to an inclined angle formed along extending direction of the armchair type graphene nano-strip. USE - Graphene strip heterojunction double gate TFET. ADVANTAGE - The TFET suppresses off-current under on-state condition, combines the channel section with a zigzag graphene strip along current transmission direction, avoids gap formation in the channel so as to promote quantum tunneling electrons in the source region, and increases on-state current. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a graphene strip heterojunction double gate TFET switching characteristic increasing method. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a graphene strip heterojunction double gate TFET.