▎ 摘　　要

NOVELTY - Producing patterned graphene, comprises etching the graphene using an ink pattern, drying the ink pattern, forming the ink pattern including a conductive material or a dopant on the graphene, and forming the graphene on a substrate. USE - The method is useful for producing patterned graphene (claimed), which is useful in electric component, semiconductor device, display devices including touch panel, and printed circuit boards or for radio-frequency identification. ADVANTAGE - The method produces patterned graphene with improved mechanical stability, chemical stability and electrical conductivity.