• 专利标题:   Graphene printing apparatus used to print graphene onto substrate, comprises gas source to cause graphene precursor gas to flow across substrate surface and localized heat source to locally heat portions of surface to cause graphene to grow.
  • 专利号:   WO2019240784-A1
  • 发明人:   IONESCU R, HOLDER H A, GE N, WITTKOPF J
  • 专利权人:   HEWLETTPACKARD DEV CO LP
  • 国际专利分类:   B41J002/00, C01B032/186, C03B025/10
  • 专利详细信息:   WO2019240784-A1 19 Dec 2019 C01B-032/186 202007 Pages: 35 English
  • 申请详细信息:   WO2019240784-A1 WOUS037248 13 Jun 2018
  • 优先权号:   WOUS037248

▎ 摘  要

NOVELTY - Graphene printing apparatus comprises: a gas source to cause a graphene precursor gas to flow across a surface of a substrate; and a localized heat source to locally heat portions of the surface to cause graphene to grow at the portions of the surface based on a printing pattern. USE - The apparatus is useful for printing graphene onto a substrate (claimed). ADVANTAGE - The apparatus: provides a cost-effective and time-efficient manner for applying graphene onto a substrate as defined shapes and/or patterns without utilization of additional etching or cuffing processes, thus saving time and costs; and provides the desired pattern used to direct or aim the localized heating source to heat portions of the substrate, thus causing graphene to grow on the portions of the substrate. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) printing graphene onto a substrate, comprising causing a graphene precursor gas to flow across a surface of the substrate, and directing, based on a pattern, a heat source to locally heat portions of the surface to cause graphene to grow on the portions of the surface; and (2) a tangible machine readable medium comprising instructions, which when executed, cause a processor to at least calculate a movement of a localized heat source based on a pattern, where the localized heat source is to be directed towards a surface of a substrate and graphene precursor gas is to flow across the surface, and direct movement of the localized heat source based on the pattern.