▎ 摘　　要

NOVELTY - A substrate treatment apparatus comprises a substrate support assembly (100) having a spin head (110) onto which a substrate is seated, a fluid supply unit (200) for supplying fluid to the substrate, a bowl assembly (300) having bowls overlaid one another outwardly in a radial direction to surround the substrate support assembly, and an ascending and descending unit (400) for moving up and down the bowl assembly, where the bowls constituting the bowl assembly move up and down independently of one another. The bowls comprise lower bowels, upper bowls, and connection bowls. The connection bowls comprise buffer grooves. The lower bowls and the connection bowls are disposed adapters made of resin to which carbon is added. The adapters are made of fluorine resin-based material containing carbon nanotubes, graphene, or carbon black as carbon-based components. The adapters and the top ends of lower bowls are fixed to one another using fixing pins made of resin. USE - Apparatus for treating substrate for manufacturing semiconductor device. ADVANTAGE - The substrate treatment apparatus improves productivity, prevents chemical liquid or gas from rebounding and thus flowing backward towards a substrate, and prevent bowls from being charged by an electrostatic force without having bad influence on cleaning of the substrate. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of substrate treatment apparatus. 100Substrate support assembly 110Spin head 200Fluid supply unit 300Bowl assembly 400Ascending and descending unit