• 专利标题:   Method for classifying images for forming oligolayer flakes of substrate, involves forming micrograph of surface, and classifying micrograph into one of set of categories, where set of categories includes category comprising micrographs.
  • 专利号:   US2023091882-A1
  • 发明人:   JIANG Z, SIU M, FONG K C
  • 专利权人:   RAYTHEON BBN TECHNOLOGIES CORP
  • 国际专利分类:   C01B032/19, G06K009/62, G06N003/04, G06V010/82
  • 专利详细信息:   US2023091882-A1 23 Mar 2023 G06K-009/62 202326 English
  • 申请详细信息:   US2023091882-A1 US992815 22 Nov 2022
  • 优先权号:   US675728P, US992815

▎ 摘  要

NOVELTY - The method involves forming a micrograph i.e. visible optical micrograph, of a surface. The micrograph is classified into one of a set of categories, where the set of categories includes a first category comprising micrographs including a monolayer flake, and a second category, consisting of micrographs including bilayer flakes, the first category includes a third category, consisting of micrographs including an oligolayer flake and a fourth category, a neural network is formed as a residual neural network and convolutional neural network and the neural network is a neural network selected from a group consisting of ResNet18, ResNet152, ResNet101, ResNet50, and ResNet34. USE - Method for classifying images for forming oligolayer flakes of a substrate. Uses include but are not limited to monolayer or bilayer flakes such as graphene or graphene material, information processing systems, transson junctions and sensitive bolometers. ADVANTAGE - The method enables effectively assessing performance of candidate process for forming thin flakes of material. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for: (1) a method for classifying exfoliation techniques; (2) a system for classifying attempts to form oligolayer flakes. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a hybrid schematic process micrograph chart.