▎ 摘　　要

NOVELTY - The method involves processing ring element of graphene oxide for patternizing laser irradiated in the phase, during the rising condition. The single layer or multi layer structure is made of silicone, silica, glass, and graphene oxide paper. The substrate is made of silicon oxide, gallium oxide and magnesium oxide. USE - Patterning method of graphene used in graphene device (all claimed). ADVANTAGE - The imperfection ring element of the graphene oxide cannot be induced, thus performing the nano pattern about the graphene effectively with excellent processing efficiency. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) patterned graphene; and (2) graphene device. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view illustrating the patterning of graphene. (Drawing includes non-English language text)