▎ 摘　　要

NOVELTY - Preparing graphene film comprises forming a passivation layer on a metal substrate, forming a hole in the passivation layer so that the metal substrate leaks out through the hole, forming a graphene film on a hole exposing the metal substrate, and covering passivation layer by graphene film. USE - The method is useful for preparing graphene film. ADVANTAGE - The method achieves selective passivation of the metal substrate, controls the area and number of areas that make the metal substrate catalytic and the growth rate of the graphene film. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for device comprising graphene film. DESCRIPTION OF DRAWING(S) - The drawing shows a flow chart of the process of preparing graphene film (Drawing includes non-English language text).