• 专利标题:   Graphene synthesizer for synthesizing graphene used in e.g. touch panel, has second auxiliary heating unit that is heated by absorbing radiant heat and convection heat, and that is provided for emitting heat into inner space of chamber.
  • 专利号:   WO2014115942-A1, KR2014096648-A, CN105246588-A, KR1842027-B1
  • 发明人:   WON D, YOON J, WON D K, YOON J H, YUAN D
  • 专利权人:   SAMSUNG TECHWIN CO LTD, HANWHA TECHWIN CO LTD
  • 国际专利分类:   B01J019/24, C01B031/02
  • 专利详细信息:   WO2014115942-A1 31 Jul 2014 B01J-019/24 201453 Pages: 23
  • 申请详细信息:   WO2014115942-A1 WOKR007568 26 Aug 2013
  • 优先权号:   KR009457, CN80071641

▎ 摘  要

NOVELTY - The graphene synthesizer (100) has a gas supply unit (140) that is provided for supplying gas containing carbon to an inner space (I) of a chamber (101). A main heating unit (130) is provided for irradiating radiant heat to inner space of chamber. A first auxiliary heating unit (110) is arranged for converting the radiant heat to convection heat, and emitting the convection heat into inner spaces. A second auxiliary heating unit (120) is heated by absorbing the radiant heat and convection heat, and is provided for emitting the heat into inner spaces. USE - Graphene synthesizer for synthesizing graphene used in touch panel, transparent display, flexible display, electric component, photoelectric device, battery and solar cell. ADVANTAGE - Since the auxiliary heating units are provided in spaces of substrate, the high quality graphene is effectively synthesized with multiple substrates. Thus, the productivity of graphene is improved. DETAILED DESCRIPTION - The graphene synthesizer has a second auxiliary heating unit in which a penetrated hole is formed. Specific side of second auxiliary heating unit is divided into four quadrants. The second auxiliary heating unit is provided with several symmetrical holes, and is made of material in which graphite or oxide film is coated. The second auxiliary heating unit of substrates (1-3) is intersected to the direction of gravity. An exhausting unit (150) is provided for ejecting the gas of inner space to outside, and is arranged in the intersection direction of substrates. An INDEPENDENT CLAIM is included for a graphene synthetic method which includes a process for laying substrates in inner space of chamber. Several auxiliary heating units are arranged in the inner spaces of substrates. The gas containing carbon is supplied to inner space of chamber. The radiant heat for heating is irradiated to inner space of chamber. The ambient gas is injected in the inner space. The pressure in inner space of substrate is reduced. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of the graphene synthesizer. Substrates (1-3) Graphene synthesizer (100) Chamber (101) Auxiliary heating units (110,120) Main heating unit (130) Gas supply unit (140) Exhausting unit (150) Inner space of chamber (I)