▎ 摘　　要

NOVELTY - Preparing patterned graphene film comprises e.g. (i) attaching graphene/metal substrate in growth of graphene side to the base film to obtain base film/graphene/metal substrate structure, (ii) setting the mask on one side of the metal substrate, needing the shape of the mask to remove graphene pattern to obtain base film/graphene/metal substrate/mask structure, (iii) placing the intermediate product with the mask obtained in step (ii) in the etching solution to rub the metal substrate which is not protected by mask, and (iv) peeling the mask and the masked metal substrate. USE - The method is useful for preparing patterned graphene film (claimed). DETAILED DESCRIPTION - Preparing patterned graphene film comprises (i) attaching graphene/metal substrate in growth of graphene side to the base film to obtain base film/graphene/metal substrate structure, (ii) setting the mask on one side of the metal substrate, needing the shape of the mask to remove graphene pattern to obtain base film/graphene/metal substrate/mask structure, (iii) placing the intermediate product with the mask obtained in step (ii) in etching solution to rub the metal substrate which is not protected by mask, and the metal substrate of the mask and mask protection still exists, and (iv) peeling the mask and the masked metal substrate to obtain patterned graphene film.