• 专利标题:   Apparatus useful for performing noncovalent functionalization, comprises motor configured to turn roller equipped with thermal regulation mechanism, and Langmuir trough for preparing molecular monolayer or thin film.
  • 专利号:   US2021060604-A1
  • 发明人:   CLARIDGE S A, HAYES T R, ZIMMERMAN J R
  • 专利权人:   PURDUE RES FOUND
  • 国际专利分类:   B05D001/20, B05D003/06, B22F001/00, B22F009/24, C01B032/194, C01B032/21, C01G039/06, C01G041/00, C08F038/00, C09D149/00
  • 专利详细信息:   US2021060604-A1 04 Mar 2021 B05D-001/20 202124 English
  • 申请详细信息:   US2021060604-A1 US004082 27 Aug 2020
  • 优先权号:   US893514P, US004082

▎ 摘  要

NOVELTY - Apparatus comprises (a) a motor configured to turn a roller equipped with a thermal regulation mechanism, and (b) a Langmuir trough for preparing a molecular monolayer or thin film comprising functional amphiphiles, where the roller comprises a disk mounted on a translator that brings the disk in contact with the functional monolayer or thin film, and to the periphery of the disk is mounted a two-dimensional material substrate. The motor is a stepper motor fit for fine speed control of the roller's rotation while the disk is in contact with the functional monolayer or thin film during transferring process. The two-dimensional material substrate is mounted to the disk through an adhesive. The adhesive is stable toward use at an elevated temperature. The molecular monolayer or thin film is capable of being transferred to create a surface conferring controllable wetting characteristics or chemical functional patterns on the material substrate. USE - The apparatus is useful for performing noncovalent functionalization of a two-dimensional material substrate using Langmuir-Schaefer conversion. ADVANTAGE - The apparatus stabilizes molecular monolayer or thin film following transfer, has controllable wetting characteristics or pattern and ensures uniform contact. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) A process for performing noncovalent functionalization of the two-dimensional material substrate using Langmuir-Schaefer conversion. (2) A sub-nanometer-thick coating or functional surface on the two-dimensional material.