▎ 摘　　要

NOVELTY - The etching method (100) involves providing (110) patterned substrate comprising one or more hydrophobic regions and hydrophilic regions patterned on surface of patterned substrate, disposing (120) graphene on the surface of patterned substrate, and applying (130) a resist to surface of graphene opposite to the patterned substrate. The exposed portions of graphene are etched (150) to form one or more etched graphene structures. USE - Etching method of graphene. ADVANTAGE - Obtains the desired adhesion pattern for the surfactant based on observed selectivity since the pattern for the substrate can be readily configured. Prevents or reduces etching of portions of the graphene by providing cured resist layer. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) a graphene composite; and (2) a making system of etched graphene system. DESCRIPTION OF DRAWING(S) - The drawing shows the flow diagram illustrating the method of etching graphene. Etching method (100) Patterned substrate providing step (110) Graphene disposing step (120) Resist applying step (130) Resist curing step (140) Exposed portion etching step (150) Resist removing step (160)