• 专利标题:   Hafnium oxide graphene defect control layer ferroelectric memory device, has ferroelectric insulating layer provided with channel layer that is provided with source and drain electrodes, where channel layer is made of graphite material.
  • 专利号:   CN205828438-U
  • 发明人:   CAI W, LIU Y, TAN Q, WANG Q, YANG Z
  • 专利权人:   UNIV YUNNAN
  • 国际专利分类:   H01L045/00
  • 专利详细信息:   CN205828438-U 21 Dec 2016 H01L-045/00 201706 Pages: 6 Chinese
  • 申请详细信息:   CN205828438-U CN20530138 03 Jun 2016
  • 优先权号:   CN20530138

▎ 摘  要

NOVELTY - The utility model belongs to the technical field of storage, specifically relates to a hafnium oxide-based defect control layer graphene ferroelectric memory, comprising a substrate layer, a gate electrode, a defect control layer, a ferroelectric insulating layer, the graphene layer, the source electrode and the drain electrode; the substrate layer is provided with a gate electrode, the gate electrode is provided with a defect control layer, a defect control layer is provided with a ferroelectric insulating layer, a ferroelectric insulating layer is provided with layers of graphene, a graphene layer is provided with a source electrode and a drain electrode, the defect control layer is made of HfO2. the material of the channel layer is graphene. The utility model claims a small device size, device power consumption, strong capability of resisting fatigue and maintain performance of the device based on hafnium oxide defect control layer graphene ferroelectric memory.