• 专利标题:   Manufacturing graphene nano ribbon used in electric component, comprises forming grooves and protrusion part by etching mesa on top surface of substrate, forming thin film layer on grooves, and performing reactive ion etching of film layer.
  • 专利号:   KR2013050169-A, KR1339426-B1
  • 发明人:   KO G W, SIM S H, HWANG S W, SONE C S
  • 专利权人:   SAMSUNG ELECTRONICS CO LTD
  • 国际专利分类:   C01B031/02, H01L021/027, H01L021/329, H01L023/29
  • 专利详细信息:   KR2013050169-A 15 May 2013 C01B-031/02 201369 Pages: 10
  • 申请详细信息:   KR2013050169-A KR115379 07 Nov 2011
  • 优先权号:   KR115379

▎ 摘  要

NOVELTY - The method comprises forming multiple grooves and a protrusion part by etching mesa on a top surface of a substrate, forming an oxidation graphene thin film layer on a top surface of the grooves, performing reactive ion etching on the oxidation graphene thin film layer, and forming a graphene nano ribbon in a sidewall of the protrusion part. The grooves and the protrusion part are extended in the form of the band and aligned with each other. The oxidation graphene thin film layer is formed on the grooves and the protrusion part with fixed thickness. USE - The method is useful for manufacturing a graphene nano ribbon, which is useful in an electric component (all claimed). ADVANTAGE - The method is capable of manufacturing the graphene nano ribbon with high energy band gap. DETAILED DESCRIPTION - The method comprises forming multiple grooves and a protrusion part by etching mesa on a top surface of a substrate, forming an oxidation graphene thin film layer on a top surface of the grooves, performing reactive ion etching on the oxidation graphene thin film layer, and forming a graphene nano ribbon in a sidewall of the protrusion part. The grooves and protrusion part are extended in the form of the band and aligned with each other. The oxidation graphene thin film layer is formed on the grooves and the protrusion part with fixed thickness. The step of forming the oxidation graphene thin film layer comprises spin-coating oxidation graphene, dispersed within the solution, on the substrate. The etching step is performed under oxygen-plasma atmosphere. The rest oxidation graphene thin film layer etches a part of the oxidation graphene thin film layer within the grooves within the protrusion part while the substrate is inclined. The step of forming the graphene nano ribbon is performed at 60 degrees C and using hydrazine as reducing agent. INDEPENDENT CLAIMS are included for: (1) a method for manufacturing an electric component; and (2) an electric component.