▎ 摘　　要

NOVELTY - A method of preparing graphene directly on the surface of substrate, involves: (1) selecting a substrate; (2) grinding catalyst powder with organic adhesive to obtain catalyst slurry; (3) coating the catalyst slurry on the surface of the substrate using spin coating and drying at room temperature; (4) placing the spin-coated substrate in a high temperature atmosphere in vacuum furnace, and passing gas, and raising the temperature to the graphene growth temperature to obtain graphene thin film; and (5) in reducing atmosphere, annealing the substrate at high temperature. USE - In preparing graphene directly on the surface of substrate (claimed) for flat panel display, transistor, microelectronic and optoelectronic device. ADVANTAGE - The method provides graphene product having low density, and high electrical conductivity.