• 专利标题:   Carrier used for preparing graphene by plasma enhanced chemical vapor deposition, comprises two oppositely set polar plates and growth substrate, where carrier comprises sleeve, hollow structure, first supporting parts and second supporting parts.
  • 专利号:   CN212425452-U
  • 发明人:   PENG H, WANG K, YANG H, WANG X, CAO F, WU Q, LIU Z
  • 专利权人:   BEIJING GRAPHENE INST, UNIV PEKING
  • 国际专利分类:   C01B032/186
  • 专利详细信息:   CN212425452-U 29 Jan 2021 C01B-032/186 202114 Pages: 9 Chinese
  • 申请详细信息:   CN212425452-U CN21106694 16 Jun 2020
  • 优先权号:   CN21106694

▎ 摘  要

NOVELTY - The utility model claims a carrier, applied in device for preparing graphene by PECVD, the device comprises two oppositely set polar plates and a growth substrate, the carrier comprises a sleeve, a plurality of first supporting parts and a plurality of second supporting parts, the sleeve is hollow structure; a plurality of first supporting parts are set in the sleeve, and are arranged at intervals along the direction vertical to the polar plate; the plurality of second supporting parts are set in the sleeve, and are arranged at intervals along the direction vertical to the polar plate; two opposite sides of each pole plate can be respectively lapped on one of the plurality of first supporting part and one of the plurality of second supporting part; two pole plates are arranged in parallel; the two opposite sides of the growth substrate can be respectively lapped on the other one of the plurality of first supporting part and the other one of the plurality of second supporting part; and the growth substrate is located between the two polar plates.