▎ 摘　　要

NOVELTY - Graphene transparent conducting films are prepared by (A) preparing graphene dispersion liquid, (B) performing electrophoretic deposition, (C) preparing graphene film, (D) performing graphite film transfer; (E) preparing graphene conductive film, and (F) performing graphite film performance test. The step (D) comprises after drying of anode copper sheet deposited with graphene film, coating poly(methyl methacrylate) (PMMA) with 1% anisole solution, naturally drying, forming layer of transparent PMMA film on graphene film surface, and soaking in 3 g/mL ferric trichloride aqueous solution. USE - Method for preparing graphene transparent conducting films. ADVANTAGE - The method prepared films has flat surface and less defect, light transmittance of 82.1%, film resistance of 1.0 M ohms/sq. It has simple operation, easy control and lower coat, and is suitable for large-scale preparation as compared with the other conventional method. DETAILED DESCRIPTION - Graphene transparent conducting films are prepared by (A) preparing of graphene dispersion liquid, (B) performing electrophoretic deposition, (C) preparing graphene film, (D) performing graphite film transfer; (E) preparing graphene conductive film, and (F) performing graphite film performance test. The step (A) comprises taking 0.1-0.2 mL amino methyl piperazine (AMP) and 0.08 mL deionized water and adding to 20 mL dimethyl formamide (DMF) to obtain AMP (0.5-1.0 vol.%)/water (0.4 vol.%)/DMF solution and uniformly mixing; and providing 0.2-0.4 g graphite powder and adding the mixed solution, ultrasonic peeling for 24-30 hours at 72 W, putting the suspension into centrifuge tube, using 800 centrifugal machine at 4000 revolutions/minute (rpm) for 90-120 minutes to obtain clean supernatant and standing for future use. The step (B) comprises mechanical polishing of copper foil and electroplating processing. The mechanical polishing process comprises using sand paper copper foil, removing surface oxide film using P-1 type polishing machine, mechanical polishing, cutting into 1.8 cmx 3.5 cm long, using alcohol to wash, and drying for further use. The copper foil electroplating process comprises using saturated copper acetate solution to polish copper sheet as electrode, using deionized water continuously, washing plating and copper sheet to remove surface of electrolyte, and drying for future use. The step (C) comprises diluting prepared graphene dispersion liquid to 7 mu g/mL for 10 minutes and uniformly mixing, using electrophoresis apparatus as power source with electrodes of 80V/cm, and depositing after quickly taking out anode copper sheet at 90 degrees C. The step (D) comprises after drying of anode copper sheet deposited with graphene film, coating PMMA with 1% anisole solution at room temperature, naturally drying, forming layer of transparent PMMA film on graphene film surface, and soaking in 3 g/mL ferric trichloride aqueous solution; soaking for 12 hours after etching, where ferric trichloride graphene film is floated on liquid surface, and putting graphite alkene film; placing in 3 times deionized water for 10 minutes to remove residual etching solution, putting graphene film to the cleaned glass slide, and naturally drying; and dissolving PMMA film for 12 hours, and removing graphene on surface to obtain glass slide. The step (E) comprises heat treatment in air at 250 degrees C to obtain graphene thin film for 2 hours, and acid treatment to film with 50% dilute nitric acid for 2 hours. The step (F) comprises using light transmittance by U-3010 UV-visible spectrophotometer.