• 专利标题:   Method for manufacturing graphene quantum-dot thin film used in carbon-based thin film transistor, involves evaporating solution containing graphene quantum dot and depositing thin film of graphene quantum dot on base material.
  • 专利号:   KR2016074157-A, KR1823523-B1
  • 发明人:   LEE H, SEO S, YOON Y
  • 专利权人:   UNIV SUNGKYUNKWAN RES BUSINESS FOUND, UNIV SUNGKYUNKWAN RES BUSINESS FOUND
  • 国际专利分类:   H01L029/66, H01L029/786
  • 专利详细信息:   KR2016074157-A 28 Jun 2016 201651 Pages: 15
  • 申请详细信息:   KR2016074157-A KR183069 18 Dec 2014
  • 优先权号:   KR183069

▎ 摘  要

NOVELTY - The method involves evaporating solution containing graphene quantum dot and depositing a thin film of graphene quantum dot on base material (10). The size of graphene quantum dot is 1-100 nm. The graphene is oxide graphene. USE - Method for manufacturing graphene quantum-dot thin film used in carbon-based thin film transistor (claimed). ADVANTAGE - The performance of thin film transistor is determined according to the crystalline state of thin film. The dispersion property of graphene quantum dot is improved and the deposition through the solution process is possible. The performance of transistor is improved. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for thin film transistor. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view illustrating the manufacturing method for graphene quantum-dot thin film. (Drawing includes non-English language text) Base material (10)