• 专利标题:   System e.g. in graphene transfer method comprises e.g. graphene conveying unit having carrier substrate adhered with graphene and heat treatment module disposed under jig with transfer substrate inserted into seating groove to be seated.
  • 专利号:   KR2391237-B1, WO2023063473-A1
  • 发明人:   YI S, LEE S K
  • 专利权人:   ALPHA GRAPHENE CO LTD, ALPHA GRAPHENE INC
  • 国际专利分类:   B32B037/00, B32B038/00, B32B038/18, B32B043/00, C01B032/194
  • 专利详细信息:   KR2391237-B1 27 Apr 2022 C01B-032/194 202237 Pages: 24
  • 申请详细信息:   KR2391237-B1 KR136743 14 Oct 2021
  • 优先权号:   KR136743

▎ 摘  要

NOVELTY - System comprises a substrate supply unit (100) for supplying a substrate loading unit and a graphene transfer unit (500) in a vacuum state, and performing a first heat treatment process; a substrate processing unit (200) receiving the graphene transfer unit and the substrate loading unit, and performing graphene transfer process through a second heat treatment process; and a substrate discharging unit (300) through which the substrate loading unit on which the graphene transfer process is completed is discharged from the substrate processing unit, where the graphene conveying unit includes a carrier substrate (530) to which graphene is adhered, and the substrate loading unit includes a transfer substrate on which the graphene is transferred; a jig (420) into which the transfer substrate is inserted into the seating groove to be seated; and a heat treatment module (430) disposed under the jig. USE - The system is useful in graphene transfer method (claimed) for next-generation electronic devices, optoelectronic devices, solar cells, light-emitting diodes (LEDs), touch screens and photodetectors. ADVANTAGE - The system improves the quality and mass productivity of graphene based on reduction of the process time, having high charge transfer, excellent transmittance, excellent flexibility and strength, good bending characteristics and high sensitivity to light; and prevents damage and contamination of graphene caused by pressure and heat applied to the carrier substrate. DETAILED DESCRIPTION - System comprises a substrate supply unit (100) for supplying a substrate loading unit and a graphene transfer unit (500) in a vacuum state, and performing a first heat treatment process; a substrate processing unit (200) receiving the graphene transfer unit and the substrate loading unit, and performing graphene transfer process through a second heat treatment process; and a substrate discharging unit (300) through which the substrate loading unit on which the graphene transfer process is completed is discharged from the substrate processing unit, where the graphene conveying unit includes a carrier substrate (530) to which graphene is adhered, and the substrate loading unit includes a transfer substrate on which the graphene is transferred; a jig (420) into which the transfer substrate is inserted into the seating groove to be seated; and a heat treatment module (430) disposed under the jig, where the first heat treatment process and the second heat treatment process are each individually controlled using the heat treatment module. An INDEPENDENT CLAIM is also included for graphene transfer method using the system. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of system for graphene transfer method. Substrate supply unit (100) Substrate processing unit (200) Substrate discharging unit (300) Jig (420) Heat treatment module (430) Graphene transfer unit (500) Carrier substrate (530)