• 专利标题:   Nonvolatile memory apparatus for e.g. phase-change random access memory, consists of electrode(s), resistive-change material layer, diffusion prevention layer comprising two-dimensional material, and blocking layer.
  • 专利号:   US2021020835-A1, US11329223-B2
  • 发明人:   LEE M, PARK S, SONG H, SHIN H, KIM K, LEE S, KANG Y
  • 专利权人:   SAMSUNG ELECTRONICS CO LTD, UNIV SEOUL NAT R DB FOUND, SAMSUNG ELECTRONICS CO LTD
  • 国际专利分类:   G11C013/00, H01L021/768, H01L045/00
  • 专利详细信息:   US2021020835-A1 21 Jan 2021 H01L-045/00 202113 Pages: 19 English
  • 申请详细信息:   US2021020835-A1 US060884 01 Oct 2020
  • 优先权号:   KR138453

▎ 摘  要

NOVELTY - A nonvolatile memory apparatus consists of an electrode (e1) (20), an electrode (e2) (70) separated from the electrode (e1), a resistive-change material layer (50) between the electrode (e1) and the electrode (e2) and configured to store information due to a resistance change caused by an electrical signal applied through the electrode (e1) and the electrode (e2), a diffusion prevention layer (40) between the electrode (e1) and the resistive change material layer and including a two-dimensional (2D) material, and a blocking layer arranged on the diffusion prevention layer. USE - Nonvolatile memory apparatus. Uses include but are not limited to phase-change random access memory (PRAM), flash memory, resistive-change RAM (RRAM), ferroelectric RAM (FeRAM), and magnetic RAM. ADVANTAGE - The nonvolatile memory apparatus has high reliability and improved resistance characteristics of the resistive-change material layer due to the diffusion prevention layer. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic cross-sectional view of the nonvolatile memory apparatus. Pad electrode (10) Electrodes (20,70) Interlayer insulating layer (30) Diffusion prevention layer (40) Resistive-change material layer (50)