▎ 摘　　要

NOVELTY - Manufacturing graphene nanoarray, comprises: preparing substrate (10) having graphene sheet (20) disposed on it; sequentially forming protective layer (30), sacrificial layer (40) and resist layer (50) on sheet; forming hole pattern in surface of resist layer; etching sacrificial layer and protective layer; forming metal layer of nanocup pattern along sidewall of trench; removing lower surface of metal layer; removing resist layer and sacrificial layer; etching protective layer and graphene sheet adjacent to protective layer; and removing protective layer and metal layer. USE - The method is useful for manufacturing a graphene nanoarray (claimed) which is used as channels of a field-effect transistor. ADVANTAGE - The method provides graphene nanoarray at low cost. DETAILED DESCRIPTION - Manufacturing a graphene nanoarray, comprises: preparing a substrate (10) having a graphene sheet (20) disposed on it; sequentially forming a protective layer (30), a sacrificial layer (40) and a resist layer (50) on the graphene sheet; forming a hole pattern in a surface of the resist layer; etching the sacrificial layer and the protective layer along the hole pattern to form a trench such that a portion of the protective layer adjacent to the graphene sheet remains; forming a metal layer of a nanocup pattern along a sidewall of the trench while rotating the trench; removing a lower surface of the metal layer to form a metal layer in a nanotube pattern; removing the resist layer and the sacrificial layer; etching the protective layer and the graphene sheet adjacent to the protective layer along the nanotube pattern; and removing the protective layer and the metal layer to form a graphene nanoarray. DESCRIPTION OF DRAWING(S) - The figure shows a sectional view of a method for manufacturing the graphene nanoarray. Substrate (10) Graphene sheet (20) Protective layer (30) Sacrificial layer (40) Resist layer (50)