专利标题: Manufacture of oxidation graphene involves exposing ultraviolet ray exposure is exposed at wavelength of 160-200 nm,preferably 180-190 nm.
专利号: KR2013015921-A, KR1347860-B1
发明人: HUI H G, HUI L Y, HAN G H, LEE Y H
专利权人: UNIV SUNGKYUNKWAN RES BUSINESS FOUND, NANO LAB CO LTD LP, UNIV SUNGKYUNKWAN RES BUSINESS FOUND
国际专利分类: B01J019/08, C01B031/02
专利详细信息: KR2013015921-A 14 Feb 2013 C01B-031/02 201354 Pages: 5
申请详细信息: KR2013015921-A KR078258 05 Aug 2011
优先权号: KR078258
▎ 摘 要
NOVELTY - Manufacture of oxidation graphene involves exposing ultraviolet ray.
USE - Manufacture of oxidation graphene (claimed).
ADVANTAGE - The oxidation graphene is efficiently manufactured.
