• 专利标题:   Cleaning liquid for sapphire substrate wafer, contains surfactant that is formed using graphene, urea, stearic acid, acetone, Nepeta oil, diethylaminoethanol, and cinnamaldehyde diethyl acetal.
  • 专利号:   CN105018238-A
  • 发明人:   HE G
  • 专利权人:   ANHUI DENUO CHEM CO LTD
  • 国际专利分类:   C11D001/00, C11D003/04, C11D003/12, C11D003/20, C11D003/22, C11D003/26, C11D003/382, C11D003/60
  • 专利详细信息:   CN105018238-A 04 Nov 2015 C11D-001/00 201630 Pages: 6 Chinese
  • 申请详细信息:   CN105018238-A CN10388602 30 Jun 2015
  • 优先权号:   CN10388602

▎ 摘  要

NOVELTY - A cleaning liquid comprises 75-85 pts. wt. deionized water, 4-6 pts. wt. surfactant, 4-6 pts. wt. dimethyl ketoxime, 2-4 pts. wt. sodium carbonate, 1-2 pts. wt. vermiculite powder, 4-6 pts. wt. azelaic acid, 1.5-2.5 pts. wt. tea extract, 0.4-0.6 pts. wt. ethylene glycol, 3-5 pts. wt. isoamyl acetate, and 5-15 pts. wt. tert-butanol. The surfactant is formed using 5 pts. wt. graphene, 0.2 pt. wt. urea, 0.5 pt. wt. stearic acid, 20 pts. wt. acetone, 0.1 pt. wt. Nepeta oil, 0.5 pt. wt. diethylaminoethanol, and 3 pts. wt. cinnamaldehyde diethyl acetal. USE - Cleaning liquid for sapphire substrate wafer. ADVANTAGE - The cleaning liquid is environmentally-friendly, free of pollution and has excellent cleaning ability. The cleaning liquid removes pollutants and improves cleanliness of electronic components. The cleaning liquid is featured with simple preparation and is economical. DETAILED DESCRIPTION - A cleaning liquid comprises 75-85 pts. wt. deionized water, 4-6 pts. wt. surfactant, 1.5-2.5 pts. wt. nano-titanium carbide, 4-6 pts. wt. dimethyl ketoxime, 2-4 pts. wt. sodium carbonate, 4-6 pts. wt. isolated soybean protein, 1-2 pts. wt. vermiculite powder, 4-6 pts. wt. azelaic acid, 4-6 pts. wt. purple sweet potato anthocyanin, 1.5-2.5 pts. wt. tea extract, 0.4-0.6 pt. wt. ethylene glycol, 3-5 pts. wt. isoamyl acetate, 1.5-2.5 pts. wt. hydroxypropyl-( beta )-cyclodextrin and 5-15 pts. wt. tert-butanol. The surfactant is formed using 5 pts. wt. graphene, 0.2 pt. wt. urea, 0.5 pt. wt. stearic acid, 20 pts. wt. acetone, 0.1 pts. wt. Nepeta oil, 0.5 pt. wt. diethylaminoethanol, and 3 pts. wt. cinnamaldehyde diethyl acetal. The raw material is fed to the reaction vessel at a temperature of 40 degrees C and stirred continuously for 40 minutes to prepare the surfactant. An INDEPENDENT CLAIM is included for preparation of cleaning liquid, which involves weighing each of the raw material components, adding deionized water and t-butanol to the stirred tank, again adding soda ash, isolated soy protein, nano-titanium carbide and vermiculite powder and stirring uniformly, adding homogeneous mixture of surfactant, ethylene glycol, isoamyl acetate, hydroxypropyl-( beta )-cyclodextrin, dimethyl ketoxime, azelaic acid, purple sweet potato anthocyanins and tea extract.