• 专利标题:   Schottky barrier diode has graphene insertion layer is used for improving two-dimensional electron gas mobility between gallium oxide layer and barrier layer.
  • 专利号:   CN115347052-A
  • 发明人:   LI J, WANG J, YI X, LIANG M, FENG T, LIU Z
  • 专利权人:   INST SEMICONDUCTORS CHINESE ACAD SCI
  • 国际专利分类:   H01L021/329, H01L029/06, H01L029/872
  • 专利详细信息:   CN115347052-A 15 Nov 2022 H01L-029/872 202201 Chinese
  • 申请详细信息:   CN115347052-A CN10525116 13 May 2021
  • 优先权号:   CN10525116

▎ 摘  要

NOVELTY - Schottky barrier diode comprises a heterojunction comprising a gallium nitride layer (2), a graphene-in layer (3) and a barrier layer (4). The graphene insertion layer is used for improving the two-dimensional electron gas mobility between the gallium oxide layer and the barrier layer. USE - Schottky barrier diode for use in a semiconductor device i.e. gallium nitride-based high electron mobility transistor (HEMT). ADVANTAGE - The Schottky barrier diode breaks through the limitation of the gallium nitride material itself to the carrier mobility, greatly improves the mobility of the two-dimensional electron gas, and obtains the working device of the satisfy requirement of the terahertz wave band. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a preparation method of Schottky barrier diode. DESCRIPTION OF DRAWING(S) - The drawing shows schematically shows a structure diagram of a Schottky barrier diode. 1First substrate 2Gallium nitride layer 3Graphene 4Barrier layer 5Insulating layer 6Schottky contact electrode 7Ohm contact