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  • 专利标题:   Quantum dot diffusion plate comprises polystyrene, polycarbonates, and/or polymethyl methacrylate plastic particles quantum dot additive molded in an extrusion molding machine and composed of quantum dots covered with graphene.
  • 专利号:   CN112795108-A
  • 发明人:   CAI W
  • 专利权人:   SHANGHAI SPECTRUM R D CHEM TECHNOLOGY
  • 国际专利分类:   C08K003/04, C08K003/11, C08K003/28, C08K003/30, C08K003/32, C08K009/02, C08K009/10, C08L025/06, C08L033/12, C08L069/00, G02B005/02
  • 专利详细信息:   CN112795108-A 14 May 2021 C08L-025/06 202151 Pages: 7 Chinese
  • 申请详细信息:   CN112795108-A CN10177535 09 Feb 2021
  • 优先权号:   CN10177535

▎ 摘　　要

NOVELTY - Quantum dot diffusion plate composed of 100 pts. wt. raw materials, 1-10 pts. wt. quantum dot additive molded in an extrusion molding machine, and the quantum dot additive is composed of quantum dots covered with graphene. USE - Used as quantum dot diffusion plate. ADVANTAGE - The plate improves the stability of quantum dot particles and further enhance the diffusion effect of quantum dot diffuser.