▎ 摘　　要

NOVELTY - Manufacture of graphene film involves flowing a raw material gas of a compound having at least carbon and hydrogen on a substrate and generating plasma of the raw material gas by microwave excitation, placing the surface of the substrate in the region of the non-equilibrium plasma of the plasma, and irradiating the substrate with a laser having a power density that does not melt the substrate, growing the graphene film laterally on the surface of the substrate. USE - Manufacture of graphene film used for photovoltaic element (claimed) e.g. Schottky junction photovoltaic element such as solar cell. ADVANTAGE - The method enables easy manufacture of highly crystalline graphene film with high mobility. By growing the graphene film laterally on the surface of the substrate while irradiating with laser having power density that does not melt the substrate, it can form high-quality graphene film having high mobility uniformly and thickly. When Schottky junction photovoltaic element comprising the graphene film and substrate, the short-circuit current can be improved. The thickness of the graphene film can be controlled by the irradiation time of the laser or the power density. When the graphene film is used for the photovoltaic element, the conversion efficiency is improved. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacture of photovoltaic element, which involves forming the graphene film to form photovoltaic element having substrate and the graphene film. DESCRIPTION OF DRAWING(S) - The drawing shows a block diagram of graphene film manufacturing apparatus. Chemical vapor deposition reaction vessel (1) Exciting plate (3) Substrate (5) Heating device (7) Laser (20)