▎ 摘　　要

NOVELTY - A graphene film is deposited on base material (105) surface by microwave surface wave plasma chemical vapor deposition method in the mixed gas atmosphere. The base material pressure is 50 Pa or less, and temperature is 200-700 degrees C. The mixed gas consists of carbon containing gas and helium, or carbon containing gas, oxidation inhibitor, and helium. USE - Manufacture of graphene film (claimed). Uses include but are not limited to gas barrier films, electrode materials of touch panel, transparent conductive film for solar cells, battery, thermal radiation films. ADVANTAGE - The method efficiently provides graphene film with high purity, high yield. The graphene film has excellent transparency, electroconductivity, thermal conductivity, and gas barrier property. DESCRIPTION OF DRAWING(S) - The drawing shows the microwave surface wave plasma chemical vapor deposition apparatus. Plasma generation chamber (101) Quartz component (103) Base material (105) Exhaust gas (108) Gas inlet tube (109) Reactor (110)