• 专利标题:   Nanomaterial bacteriostatic mask includes filter material comprising bamboo carbon fiber and graphene oxide.
  • 专利号:   CN111728294-A
  • 发明人:   YE X, ZHANG Y, ZHAO B, YAO L, LIU P, HUANG C
  • 专利权人:   NANJING MICRON ELECTRONICS IND RES INST, NANJING SENNA TECHNOLOGY CO LTD
  • 国际专利分类:   A41D013/11, A41D031/02, A41D031/04, A41D031/30, B01D039/08, B82Y040/00, C01B032/198, C01G023/053
  • 专利详细信息:   CN111728294-A 02 Oct 2020 A41D-013/11 202091 Pages: 7 Chinese
  • 申请详细信息:   CN111728294-A CN10470543 28 May 2020
  • 优先权号:   CN10470543

▎ 摘  要

NOVELTY - Nanomaterial bacteriostatic mask comprises filter material. The filter material comprises bamboo carbon fiber and graphene oxide. The bamboo carbon fiber is hollow in the interior and spiral tube wall. USE - Used as nanomaterial bacteriostatic mask. ADVANTAGE - The mask has small suction resistance and good filtration efficiency and solves contradiction between filtration efficiency and suction resistance. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for preparation of nanomaterial bacteriostatic mask comprising preparing modified graphene oxide by taking 10-20 pts. wt. graphene oxide, 80-100 pts. wt. absolute ethyl alcohol, 10-20 pts. wt. fatty acid, 8-10 pts. wt. titanate, mixing, ultrasonically dispersing, heating, refluxing and reacting, filtering, washing and and drying.