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  • 专利标题:   Processing of graphene sheet material during manufacture of electronic device, involves inactivating edge portion of graphene sheet material by irradiating material with ultraviolet light in atmosphere containing substance.
  • 专利号:   WO2010122635-A1, US2011315655-A1, JP2011510112-X, US8465661-B2, JP5299506-B2
  • 发明人:   ASANO K
  • 专利权人:   FUJITSU LTD, FUJITSU LTD
  • 国际专利分类:   C01B031/04, C23F001/00, H05K013/00, C01B031/02, B44C001/22
  • 专利详细信息:   WO2010122635-A1 28 Oct 2010 C01B-031/04 201075 Pages: 36 Japanese
  • 申请详细信息:   WO2010122635-A1 WOJP057891 21 Apr 2009
  • 优先权号:   JP510112, WOJP057891, US228785

▎ 摘　　要

NOVELTY - An edge portion of graphene sheet material is inactivated by irradiating graphene sheet material with ultraviolet light in primary atmosphere which contains primary substance which acts on the graphene sheet material. Thus, processing method of graphene sheet material is carried out. USE - Processing of graphene sheet material during manufacture of electronic device (claimed). ADVANTAGE - The graphene sheet material having desired number of layers of graphene sheet is processed by easy method. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacture of electronic device. DESCRIPTION OF DRAWING(S) - The drawings show sectional views illustrating processing method of graphene sheet material. Substrate (50) Graphene sheet material layers (52,54)