• 专利标题:   Graphene material with regularly arranged hole structure is obtained by compositing graphene material on template material and using chemical etching or laser process.
  • 专利号:   CN110877907-A
  • 发明人:   WANG C, CHEN X, SHAO J, CHEN F
  • 专利权人:   CHANGCHUN INST OPTICS FINE MECHANICS P
  • 国际专利分类:   B82Y030/00, B82Y040/00, C01B032/194
  • 专利详细信息:   CN110877907-A 13 Mar 2020 C01B-032/194 202028 Pages: 8 Chinese
  • 申请详细信息:   CN110877907-A CN10918218 26 Sep 2019
  • 优先权号:   CN10918218

▎ 摘  要

NOVELTY - A graphene material with regularly arranged hole structure is obtained by providing template material with regularly arranged hole structure; compositing graphene material on template material; using chemical etching or laser process to prepare regularly arranged hole structure on graphene material; and removing template. USE - Graphene material with regularly arranged hole structure. ADVANTAGE - The graphene material has preparation process that is simple, easy to control reaction and convenient, and requires simple device and short time. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for prepared graphene material with regularly arranged hole structure.