▎ 摘　　要

NOVELTY - Manufacture of thin film (17) involves providing a graphene layer (13) on one surface of a substrate (11), functionalizing the surface by treating the other surface opposite to the one surface of the graphene layer provided with the substrate using a reactant, depositing a thin film on the other surface of the functionalized graphene layer (15) to form a composite, and separating the thin film from the composite (100) by heating. USE - Manufacture of thin film (claimed) e.g. ferroelectric film, metal film, semiconductor film, and insulating film used for field effect transistor. ADVANTAGE - The method enables production of thin film having high quality, and excellent flexibility and usability, and suppressed generation of defects and foreign substance. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the thin film. DESCRIPTION OF DRAWING(S) - The drawing shows schematic view illustrating manufacture of the thin film. 11Substrate 13Graphene layer 15Functionalized graphene layer 17Thin film 100Composite