• 专利标题:   Graphene growth quality detecting method, involves processing graphene with copper substrate by illuminating light from infrared lamp, and measuring growth quality of graphene in substrate by optical microscope or optical magnifier.
  • 专利号:   CN102749291-A
  • 发明人:   GUO X, JIA C, JIANG J
  • 专利权人:   UNIV PEKING
  • 国际专利分类:   G01N021/25
  • 专利详细信息:   CN102749291-A 24 Oct 2012 G01N-021/25 201310 Pages: 7 Chinese
  • 申请详细信息:   CN102749291-A CN10241873 12 Jul 2012
  • 优先权号:   CN10241873

▎ 摘  要

NOVELTY - The method involves processing graphene with a copper substrate by illuminating light from an infrared lamp, where light irradiation time is greater than 1-30 min. Growth quality of the graphene in the copper substrate is measured by an optical microscope or optical magnifier. Graphene annealing process is carried out at temperature of 100-300 degrees Celsius. USE - Graphene growth quality detecting method. ADVANTAGE - The method enables performing graphene growth quality detecting process in a quick and simple manner so as to enable a user to know growth condition of the graphene in an accurate manner. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view illustrating a graphene growth quality detecting method.