▎ 摘　　要

NOVELTY - The graphene processing device has an on-off isolation valve (3) which is set between a sample placing chamber (1) and a processing chamber (2) for controlling on-off of the sample placing chamber and the processing chamber. The sample placing chamber comprises a first cavity, a sample seat and a sample conveying rod. The sample seat is located in the first cavity. The processing chamber comprises a second cavity, a sample table, a plasma coil, an upper electrode net and a lower electrode net for the plasma to pass through. The upper electrode net and the lower electrode net are set at intervals up and down and adjustable in height. A sample conveying rod of the sampling chamber conveys the sample seat to the sample table, and/or pass the sample table out from the sample stage. The plasma generated by the plasma coil discharge passes through the upper electrode net and the lower electrode net, so as to process the sample located on the sample seat in the processing chamber. USE - Graphene processing device for providing low energy injection ion for use in biological medicine and drug delivery applications. Uses include but are not limited to optical, electrical, mechanical, micro-nano processing and energy applications. ADVANTAGE - The device provides plasma generating vacuum environment with high quality, reduces atmospheric environment pollution, improves the efficiency of plasma generation, ensures the purity and reliability of the plasma, and satisfies different satisfy requirements. The device has simple integral structure, high integration and function is opened. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of the graphene processing device. 1Sample placing chamber 2Processing chamber 3On-off isolation valve 4Transmission cabinet 17Guide rail