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  • 专利标题:   Processing of graphene used for manufacture of graphene nanoribbons, involves irradiating ion beam to graphene using gas cluster ion beam apparatus, forming cluster and etching.
  • 专利号:   WO2013150931-A1, JP2013216510-A, TW201348129-A, KR2015006417-A, US2015179451-A1
  • 发明人:   MATSUMOTO TAKASHI, MATSUMOTO T
  • 专利权人:   TOKYO ELECTRON LTD, TOKYO ELECTRON LTD
  • 国际专利分类:   B01J019/12, C01B031/02, C01B031/04, H01L021/04
  • 专利详细信息:   WO2013150931-A1 10 Oct 2013 C01B-031/02 201369 Pages: 13 Japanese
  • 申请详细信息:   WO2013150931-A1 WOJP058909 27 Mar 2013
  • 优先权号:   JP086173, KR726445

▎ 摘　　要

NOVELTY - Processing of graphene involves irradiating ion beam to graphene using gas cluster ion beam apparatus, forming cluster and etching. USE - Processing of graphene used for manufacture of graphene nanoribbons (claimed) used for electronic-component material. ADVANTAGE - The method efficiently enables the processing of graphene, by a simple process.