• 专利标题:   Preparation of nitrogen-doped graphene aqueous slurry by cleaning nickel foil by diluted hydrochloric acid, placing foil in vacuum chemical vapor deposition device reaction chamber, introducing porphyrin, heating, reacting and circulating.
  • 专利号:   CN113148993-A, CN113148993-B
  • 发明人:   NAN W, WANG J, WANG C, YAN S
  • 专利权人:   AECC BEIJING AERONAUTICAL MATERIALS INST
  • 国际专利分类:   C01B032/186, C01B032/194
  • 专利详细信息:   CN113148993-A 23 Jul 2021 C01B-032/186 202177 Pages: 5 Chinese
  • 申请详细信息:   CN113148993-A CN10427194 20 Apr 2021
  • 优先权号:   CN10427194

▎ 摘  要

NOVELTY - A nitrogen-doped graphene aqueous slurry is prepared by ultrasonically cleaning nickel foil using diluted hydrochloric acid, ultrasonically cleaning using ethanol, placing cleaned nickel foil in reaction chamber of vacuum chemical vapor deposition device, introducing porphyrin on surface of nickel foil, vacuumizing, heating reaction chamber, reacting nickel foil with porphyrin, introducing ethylene gas into reaction chamber to react, cooling reaction chamber to room temperature to obtain nitrogen-doped graphene powder, dissolving nitrogen-doped graphene powder and dispersant in water, putting in high pressure homogenizer and circulating under pressure. USE - The method is used for preparing nitrogen-doped graphene aqueous slurry.