▎ 摘　　要

NOVELTY - Manufacturing a graphene layer, involves: performing a sputtering process to form a graphite layer on a substrate; and performing a lithography process on the graphite layer for thinning the graphite layer and then making the graphite layer thinned to become a graphene layer. USE - The method is useful for manufacturing a graphene layer (claimed), which is useful in electronic devices, superconductive materials, photo-electronic materials, heat dissipation materials or energy materials (such as fuel cell). ADVANTAGE - The method is capable of rapidly and economically manufacturing the graphene layer at low temperature without the need for catalyst (accelerator) and corrosive.