▎ 摘　　要

NOVELTY - Preparing graphene film comprises providing porous material powder, placing material powder in the atomic layer deposition device, depositing metal catalytic layer in an atomic layer deposition device, depositing metal catalytic layer in the pores of the porous material powder, forming porous material powder with a metal catalytic layer in the hole, using porous material powder with a metal catalytic layer in the hole, and forming porous material template with a metal catalytic layer in the hole to obtain graphene film on the porous material template. USE - The method is useful for preparing graphene film. ADVANTAGE - The film: has high porosity, large specific surface area, easy to control and high density; and is suitable for industrial use. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for preparing the porous silica powder with metal catalytic layer in the hole, comprising (a) placing porous silica powder in the atomic layer deposition device, (b) continuously passing the metal precursor for a preset time in the atomic layer deposition device, allowing to stand for preset time and continuously purging with inert gas for preset time, (c) continuously passing the reducing gas for preset time into the atomic layer deposition device, allowing to stand for the preset time, and continuously passing the inert gas for preset time and purging, and(d) repeating the steps B and C for a preset number of times to obtain porous silica powder with metal catalytic layer in the pores.