• 专利标题:   Graphene infrared detector, has substrate, dielectric layer formed on substrate, source electrode and drain electrode, and source electrode and drain electrode extending from surface of dielectric layer and infrared sensitive semiconductor film formed on graphene.
  • 专利号:   CN115101608-A
  • 发明人:   CHEN H, HUANG B, LI L, ZHANG H, CHENG C
  • 专利权人:   INST SEMICONDUCTORS CHINESE ACAD SCI
  • 国际专利分类:   H01L031/0224, H01L031/10, H01L031/109
  • 专利详细信息:   CN115101608-A 23 Sep 2022 H01L-031/0224 202292 Chinese
  • 申请详细信息:   CN115101608-A CN10694257 16 Jun 2022
  • 优先权号:   CN10694257

▎ 摘  要

NOVELTY - The graphene infrared detector comprises a substrate (1), a dielectric layer (2) formed on the substrate, a source electrode (3) and a drain electrode (4), extending from the surface of the dielectrical layer to the dieelectric layer, where the structure of the source electrode and the drain electrode is asymmetric, and a graphene (5) is formed on a surface of a graphene film, the source and drain electrodes, and an infrared sensitive semiconductor film formed in the graphene film. The drain electrode is an annular structure electrode. The source electrode is a columnar electrode and the columnar electrode is arranged in the ring of the annular electrode. USE - Graphene infrared detector. ADVANTAGE - By introducing the asymmetric electrode, finishing photoelectric detection under zero bias, solving the problem that the traditional graphene infrared detector dark current is too large, by setting the infrared sensitive semiconductor film, so as to improve the response of graphene infrared photoelectric detector. DESCRIPTION OF DRAWING(S) - The drawing shows a structure diagram of a graphene infrared detector. 1Substrate 2Medium layer 3Source electrode 4Drain electrode 5Graphene